Compiled from the following sources:

Special biographic research
Wen Wei Publishing Company, Ltd. 2002-2006

Who's Who, Current Chinese Leaders
Wen Wei Publishing Company, Ltd. 2003-2005

Revision History:

Biography Revised: 5/16/2003
Career Data Updated: 3/26/2006

PHOTO: Li Zhijian
Li Zhijian 李志坚
Microelectronics Technical Expert

Biography

Li Zhijian, male, Han nationality, is a native of Ningbo, Zhejiang Province. He graduated from Zhejiang University and obtained an assistant doctorate degree from Leningrad University in physics and mathematics.

Li Zhijian was a professor at Tsinghua University. In the research of semiconductor membrane photoconduction and photoelectricity mechanism, Li put forward the electronic grain boundary, based on which he developed a high SNR PbS infrared detector in the early 1950s. In 1959, he developed high pure polysilicon and in the 1960s he engaged in silicon component research. Li's achievements in plane silicon technology and converse piezosilicon high frequency audion promoted related research and production in the country.

After 1977, he was mainly devoted to the research of large-scale and super-large-scale integrated technology and component physics. He successfully led, directed and directly participated in the R&D of super-large-scale integrated circuit chips, such as multiple types of SRAM, 8 bit and 16 bit microprocessors, and EEPROM and 1M Chinese characters ROM. Concurrently, Li developed 3 micron and 1 micron set technology and techniques. He also invented semiconductor high-speed annealing techniques and equipment. His recent research includes system chip integration and microelectronic machine techniques.

Li Zhijian was elected an academician of the Chinese Academy of Sciences in 1991, and was elected to the Third World Academy of Science in 1999.

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